Introducing our Zirconium Amino Metal Compounds for Advanced Thin Film Deposition Processes | |
Our company launches a series of high-quality zirconium amino metal compounds, specifically designed for use in advanced thin film deposition processes such as CVD, ALD, and PEALD. These compounds are commonly used as precursors for growing ZrO2, a key material in various industries. Our products include: - Tetramethylammonium zirconium (CAS: 19756-04-8) - Tetraethylammonium zirconium (CAS: 13801-49-5) - Tetramethylethylammonium zirconium (CAS: 175923-04-3) These compounds have been meticulously synthesized to ensure high purity and excellent performance in your deposition processes. With our zirconium amino metal compounds, you can achieve precise control over film thickness, uniformity, and composition, leading to superior film quality and device performance. Whether you are working in the semiconductor, optical coatings, or energy storage industry, our zirconium amino metal compounds are the ideal choice for your thin film deposition needs. Trust in our expertise and commitment to quality to take your processes to the next level. Contact us today to learn more about our zirconium amino metal compounds and how they can benefit your specific applications. | |
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| Target State: All States Target City : All Cities Last Update : Nov 12, 2024 4:19 AM Number of Views: 28 | Item Owner : Nina Contact Email: Contact Phone: (None) |
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